Acta Chim. Slov. 44 (1997) 105-129.
INTERFACIAL REACTION IN MULTILAYER STRUCTURES STUDIED WITH X-RAY DIFFRACTION AND CROSS-SECTIONAL TRANSMISSION ELECTRON MICROSCOPY
Jozef Stefan Institute, Jamova 39,1000 Ljubljana, Slovenia
Very thin alternating layers are of interest both from a theoretical as well as a practical point of view. In this paper, the basic physical properties, preparation procedure, characterization techniques and industrial importance of such structures are described. The emphasis is placed on X-ray diffraction (XRD) and cross-sectional transmission microscopy (XTEM) as the most commonly used techniques for structural characterization of multilayers. The interdiffusion and reactions between the layers of selected multilayer systems during thermal annealing were studied.